Through-Silicon Vias for 3D Integration

Through-Silicon Vias for 3D Integration by John Lau

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A comprehensive guide to TSV and other enabling technologies for 3D integration

Written by an expert with more than 30 years of experience in the electronics industry, Through-Silicon Vias for 3D Integration provides cutting-edge information on TSV, wafer thinning, thin-wafer handling, microbumping and assembly, and thermal management technologies. Applications to highperformance, high-density, low-power-consumption, wide-bandwidth, and small-form-factor electronic products are discussed.

This book offers a timely summary of progress in all aspects of this fascinating field for professionals active in 3D integration research and development, those who wish to master 3D integration problem-solving methods, and anyone in need of a low-power, wide-bandwidth design and high-yield manufacturing process for interconnect systems.

Coverage includes:

Nanotechnology and 3D integration for the semiconductor industry

TSV etching, dielectric-, barrier-, and seed-layer deposition, Cu plating, CMP, and Cu revealing

TSVs: mechanical, thermal, and electrical behaviors

Thin-wafer strength measurement

Wafer thinning and thin-wafer handling

Microbumping, assembly, and reliability

Microbump electromigration

Transient liquid-phase bonding: C2C, C2W, and W2W

2.5D IC integration with interposers

3D IC integration with interposers

Thermal management of 3D IC integration

3D IC packaging
Publication Date:
11 / 10 / 2012

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